DocumentCode
6047
Title
Repositioning technique in nanowire manipulation by oscillating gripper
Author
Toku, Yuhki ; Kobayashi, Kaoru ; Muraoka, Michiaki
Author_Institution
Dept. of Mech. Eng., Akita Univ., Akita, Japan
Volume
8
Issue
2
fYear
2013
fDate
Feb-13
Firstpage
63
Lastpage
65
Abstract
In this study, a manipulation device is developed that is able to pick up and reposition a nanomaterial. In the device, the gripper, composed of two silicon microcantilevers, is actuated by XYZ stages on a rotational stage and has eight degrees of freedom. One of the microcantilevers can be vibrated at a resonant frequency by an acoustic oscillator mounted on the gripper base. We successfully picked up a copper (II) oxide NW grown on a substrate and then repositioned the NW. During the picking-up process, the NW was statically bent to break at the root by the gripper motion, or cyclically bent using the acoustic oscillator to induce a fatigue fracture. During the repositioning process, natural adhesion between the NW and the gripping surface often presented a challenge when removing the NW. This difficulty was overcome by vibrating the gripping surface, which resulted in the reduction of the adhesion effects. The mechanism of the reduction of the adhesion effects is discussed concerning the relationship between the adhesion energy and the peeling force acting on the NW. Another technique of repositioning using an inertia force generated by the oscillator is also discussed.
Keywords
adhesion; cantilevers; copper compounds; elemental semiconductors; fatigue; grippers; micromanipulators; nanopositioning; nanowires; optical microscopes; oscillators; piezoelectric actuators; silicon; vibrations; CuO; Si; XYZ stages; acoustic oscillator; adhesion energy; copper oxide nanowire; fatigue fracture; gripper motion; gripping surface; inertia force; manipulation device; microcantilever surface; nanomaterial; nanowire manipulation; optical microscope stage; oscillating gripper; peeling force; picking-up process; piezoelectric element; repositioning process; repositioning technique; resonant frequency; rotational stage; silicon microcantilevers;
fLanguage
English
Journal_Title
Micro & Nano Letters, IET
Publisher
iet
ISSN
1750-0443
Type
jour
DOI
10.1049/mnl.2012.0665
Filename
6545155
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