DocumentCode :
605529
Title :
New methodology for drain current local variability characterization using Y function method
Author :
Rahhal, L. ; Bajolet, A. ; Diouf, C. ; Cros, A. ; Rosa, J. ; Planes, N. ; Ghibaudo, Gerard
Author_Institution :
STMicroelectron., Crolles, France
fYear :
2013
fDate :
25-28 March 2013
Firstpage :
99
Lastpage :
103
Abstract :
Y function is well known to overcome the influence of source/drain series resistance (Rsd) in MOSFETs. In this work we present a new methodology for drain current local variability characterization using Y function method. Thus, we show that the study of Y function statistical variability permits the extraction of threshold voltage (VTH) and current gain factor (β) local variability without the influence of Rsd values. We also demonstrate a simple drain current local variability model taking into account the influence of Rsd and its variability in strong inversion regime. This new VTH and β extraction method, and drain current variability model were applied with success to advanced FDSOI and Bulk devices with different dimensions.
Keywords :
MOSFET; semiconductor device models; MOSFET; Y function method; Y function statistical variability; advanced FDSOI devices; bulk devices; current gain factor local variability; drain current local variability characterization; source-drain series resistance; threshold voltage extraction; Correlation; Current measurement; Data models; Logic gates; MOSFET; Threshold voltage; Bulk; FDSOI; MOSFET; Y function; current gain factor; drain current; local variability; source/drain series resistance; threshold voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microelectronic Test Structures (ICMTS), 2013 IEEE International Conference on
Conference_Location :
Osaka, Japan
ISSN :
1071-9032
Print_ISBN :
978-1-4673-4845-4
Electronic_ISBN :
1071-9032
Type :
conf
DOI :
10.1109/ICMTS.2013.6528153
Filename :
6528153
Link To Document :
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