DocumentCode :
605543
Title :
Process control monitors for individual single-walled carbon nanotube transistor fabrication processes
Author :
Chikkadi, K. ; Haluska, M. ; Hierold, C. ; Roman, Costica
Author_Institution :
Dept. of Mech. & Process Eng., ETH Zurich, Zurich, Switzerland
fYear :
2013
fDate :
25-28 March 2013
Firstpage :
173
Lastpage :
177
Abstract :
The manufacturing yield of carbon nanotube transistors is very sensitive to changes in fabrication process parameters, while controlling length, density and orientation of nanotubes simultaneously is still proving elusive in batch fabrication processes. Here, we show an electrode design with a yield of up to 45% working transistors despite our batch fabrication process being based on randomly grown nanotubes. Transistor parameter distributions of 765 devices are shown, demonstrating the potential of our design for process monitoring and control.
Keywords :
batch processing (industrial); carbon nanotube field effect transistors; electrodes; C; batch fabrication processes; electrode design; fabrication process parameters; manufacturing yield; process control monitors; single walled carbon nanotube transistor fabrication; transistor parameter distributions; Carbon nanotubes; Electrodes; Fabrication; Monitoring; Process control; Transistors; length and density distribution; monte carlo; process monitoring; single-walled carbon nanotube; transistor;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microelectronic Test Structures (ICMTS), 2013 IEEE International Conference on
Conference_Location :
Osaka, Japan
ISSN :
1071-9032
Print_ISBN :
978-1-4673-4845-4
Electronic_ISBN :
1071-9032
Type :
conf
DOI :
10.1109/ICMTS.2013.6528167
Filename :
6528167
Link To Document :
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