• DocumentCode
    605544
  • Title

    A proper approach to characterize retention-after-cycling in 3D-Flash devices

  • Author

    Fengying Qiao ; Arreghini, A. ; Blomme, P. ; Van den bosch, G. ; Liyang Pan ; Jun Xu ; Van Houdt, J.

  • Author_Institution
    Inst. of Microelectron., Tsinghua Univ., Beijing, China
  • fYear
    2013
  • fDate
    25-28 March 2013
  • Firstpage
    187
  • Lastpage
    191
  • Abstract
    We propose a procedure to evaluate retention-after-cycling in 3D-Flash devices. Proper comparison of retention transients requires the initial charging level to be as close as possible, but P/E cycling results in serious ID-VG degradation, preventing a consistent extraction of the threshold voltage. We introduce a test where a relaxation phase is added after cycling, consisting in baking samples for 24 hours at 200°C. This relaxation appears to anneal interface traps and to remove locally accumulated charge, restoring similar shape of ID-VG curves before and after cycling, hence allowing a proper comparison of retention of fresh and stressed devices.
  • Keywords
    annealing; flash memories; interface states; 3D flash devices; P/E cycling; annealing; interface traps; relaxation phase; retention transients; retention-after-cycling evaluation; temperature 200 degC; threshold voltage; time 24 hour; Capacitance-voltage characteristics; Capacitors; Degradation; Logic gates; Shape; Transistors; Vehicles; 3D Flash; BiCS; Interface Traps; Retention-After-Cycling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microelectronic Test Structures (ICMTS), 2013 IEEE International Conference on
  • Conference_Location
    Osaka, Japan
  • ISSN
    1071-9032
  • Print_ISBN
    978-1-4673-4845-4
  • Electronic_ISBN
    1071-9032
  • Type

    conf

  • DOI
    10.1109/ICMTS.2013.6528169
  • Filename
    6528169