Title : 
A proper approach to characterize retention-after-cycling in 3D-Flash devices
         
        
            Author : 
Fengying Qiao ; Arreghini, A. ; Blomme, P. ; Van den bosch, G. ; Liyang Pan ; Jun Xu ; Van Houdt, J.
         
        
            Author_Institution : 
Inst. of Microelectron., Tsinghua Univ., Beijing, China
         
        
        
        
        
        
            Abstract : 
We propose a procedure to evaluate retention-after-cycling in 3D-Flash devices. Proper comparison of retention transients requires the initial charging level to be as close as possible, but P/E cycling results in serious ID-VG degradation, preventing a consistent extraction of the threshold voltage. We introduce a test where a relaxation phase is added after cycling, consisting in baking samples for 24 hours at 200°C. This relaxation appears to anneal interface traps and to remove locally accumulated charge, restoring similar shape of ID-VG curves before and after cycling, hence allowing a proper comparison of retention of fresh and stressed devices.
         
        
            Keywords : 
annealing; flash memories; interface states; 3D flash devices; P/E cycling; annealing; interface traps; relaxation phase; retention transients; retention-after-cycling evaluation; temperature 200 degC; threshold voltage; time 24 hour; Capacitance-voltage characteristics; Capacitors; Degradation; Logic gates; Shape; Transistors; Vehicles; 3D Flash; BiCS; Interface Traps; Retention-After-Cycling;
         
        
        
        
            Conference_Titel : 
Microelectronic Test Structures (ICMTS), 2013 IEEE International Conference on
         
        
            Conference_Location : 
Osaka, Japan
         
        
        
            Print_ISBN : 
978-1-4673-4845-4
         
        
            Electronic_ISBN : 
1071-9032
         
        
        
            DOI : 
10.1109/ICMTS.2013.6528169