• DocumentCode
    60616
  • Title

    Memristive Biosensors Under Varying Humidity Conditions

  • Author

    Puppo, F. ; Dave, Akshat ; Doucey, M.-A. ; Sacchetto, Davide ; Baj-Rossi, Camilla ; Leblebici, Yusuf ; De Micheli, G. ; Carrara, Sandro

  • Author_Institution
    Integrated Syst. Lab., Ecole Polytech. Fed. de Lausanne, Lausanne, Switzerland
  • Volume
    13
  • Issue
    1
  • fYear
    2014
  • fDate
    Mar-14
  • Firstpage
    19
  • Lastpage
    30
  • Abstract
    We attempt to examine the potential of silicon nanowire memristors in the field of nanobiosensing. The memristive devices are crystalline Silicon (Si) Nanowires (NWs) with Nickel Silicide (NiSi) terminals. The nanowires are fabricated on a Silicon-on-Insulator (SOI) wafer by an Ebeam Lithography Technique (EBL) process that allows high resolution at the nanoscale. A Deep Reactive Ion Etching (DRIE) technique is used to define free-standing nanowires. The close alignment between Silicon (Si) and Nickel-Silicide (NiSi) terminals forms a Schottky-barrier at their junction. The memristive effect of the fabricated devices matches well with the memristor theory. An equivalent circuit reproducing the memristive effect in current-voltage (I-V) characteristics of our silicon nanowires is presented too. The memristive silicon nanowire devices are then functionalized with anti-human VEGF (Vascular Endothelial Growth Factor) antibody and I-V characteristics are examined for the nanowires prior to and after protein functionalization. The uptake of bio-molecules linked to the surface of the memristive NWs is confirmed by the increased voltage gap in the hysteresis curve. The effects of varying humidity conditions on the conductivity of bio-modified memristive silicon nanowires are deeply investigated.
  • Keywords
    Schottky barriers; bioelectric phenomena; biosensors; electron beam lithography; elemental semiconductors; equivalent circuits; memristors; molecular biophysics; nanofabrication; nanolithography; nanosensors; nanowires; nickel compounds; proteins; semiconductor growth; silicon; silicon-on-insulator; sputter etching; DRIE technique; EBL process; I-V characteristics; Schottky-barrier; Si-NiSi; antihuman VEGF antibody; biomolecules; crystalline silicon nanowires; deep reactive ion etching technique; ebeam lithography technique process; equivalent circuit; free-standing nanowires; humidity conditions; hysteresis curve; memristive NW; memristive biosensors; memristive effect; memristor theory; nanobiosensing; nickel silicide terminals; protein functionalization; silicon nanowire memristors; silicon-on-insulator wafer; vascular endothelial growth factor; voltage gap; Humidity; Integrated circuit modeling; Mathematical model; Memristors; Nanobioscience; Nanoscale devices; Silicon; Antibody; biosensor; humidity; memristor; nano-fabrication; silicon nanowire;
  • fLanguage
    English
  • Journal_Title
    NanoBioscience, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1536-1241
  • Type

    jour

  • DOI
    10.1109/TNB.2013.2295517
  • Filename
    6712150