DocumentCode :
6071
Title :
Influence of Oxygen Concentration on Self-Compliance RRAM in Indium Oxide Film
Author :
Jyun-Bao Yang ; Ting-Chang Chang ; Jheng-Jie Huang ; Yu-Ting Chen ; Hsueh-Chih Tseng ; Ann-Kuo Chu ; Sze, Simon M. ; Ming-Jinn Tsai ; Jin-Cheng Zheng ; Ding-Hua Bao
Author_Institution :
Dept. of Photonics, Nat. Sun Yat-sen Univ., Kaohsiung, Taiwan
Volume :
35
Issue :
9
fYear :
2014
fDate :
Sept. 2014
Firstpage :
909
Lastpage :
911
Abstract :
This letter investigates various oxygen concentrations in indium oxide films which induce different resistance switching behaviors, including two self-compliance behaviors and a two-step set process. The accumulated oxygen ions produce an oxygen-rich indium oxide film, which can be considered as a variable series resistor after the forming process. Analyses indicate that the lower self-compliance current can be attributed to this larger variable series resistor from the additional oxygen ions. The more significant oxidation reaction decreases the current of the high resistance state. Hence, power consumption can be reduced effectively.
Keywords :
indium compounds; oxygen; random-access storage; semiconductor thin films; InO; indium oxide films; oxidation reaction; oxygen concentration; resistance switching memory; self-compliance RRAM; variable series resistor; Educational institutions; Indium; Ions; Optical switches; Resistance; Resistors; RRAM; indium oxide; nonvolatile resistance switching memory;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2014.2336676
Filename :
6868961
Link To Document :
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