• DocumentCode
    6071
  • Title

    Influence of Oxygen Concentration on Self-Compliance RRAM in Indium Oxide Film

  • Author

    Jyun-Bao Yang ; Ting-Chang Chang ; Jheng-Jie Huang ; Yu-Ting Chen ; Hsueh-Chih Tseng ; Ann-Kuo Chu ; Sze, Simon M. ; Ming-Jinn Tsai ; Jin-Cheng Zheng ; Ding-Hua Bao

  • Author_Institution
    Dept. of Photonics, Nat. Sun Yat-sen Univ., Kaohsiung, Taiwan
  • Volume
    35
  • Issue
    9
  • fYear
    2014
  • fDate
    Sept. 2014
  • Firstpage
    909
  • Lastpage
    911
  • Abstract
    This letter investigates various oxygen concentrations in indium oxide films which induce different resistance switching behaviors, including two self-compliance behaviors and a two-step set process. The accumulated oxygen ions produce an oxygen-rich indium oxide film, which can be considered as a variable series resistor after the forming process. Analyses indicate that the lower self-compliance current can be attributed to this larger variable series resistor from the additional oxygen ions. The more significant oxidation reaction decreases the current of the high resistance state. Hence, power consumption can be reduced effectively.
  • Keywords
    indium compounds; oxygen; random-access storage; semiconductor thin films; InO; indium oxide films; oxidation reaction; oxygen concentration; resistance switching memory; self-compliance RRAM; variable series resistor; Educational institutions; Indium; Ions; Optical switches; Resistance; Resistors; RRAM; indium oxide; nonvolatile resistance switching memory;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2014.2336676
  • Filename
    6868961