DocumentCode
6071
Title
Influence of Oxygen Concentration on Self-Compliance RRAM in Indium Oxide Film
Author
Jyun-Bao Yang ; Ting-Chang Chang ; Jheng-Jie Huang ; Yu-Ting Chen ; Hsueh-Chih Tseng ; Ann-Kuo Chu ; Sze, Simon M. ; Ming-Jinn Tsai ; Jin-Cheng Zheng ; Ding-Hua Bao
Author_Institution
Dept. of Photonics, Nat. Sun Yat-sen Univ., Kaohsiung, Taiwan
Volume
35
Issue
9
fYear
2014
fDate
Sept. 2014
Firstpage
909
Lastpage
911
Abstract
This letter investigates various oxygen concentrations in indium oxide films which induce different resistance switching behaviors, including two self-compliance behaviors and a two-step set process. The accumulated oxygen ions produce an oxygen-rich indium oxide film, which can be considered as a variable series resistor after the forming process. Analyses indicate that the lower self-compliance current can be attributed to this larger variable series resistor from the additional oxygen ions. The more significant oxidation reaction decreases the current of the high resistance state. Hence, power consumption can be reduced effectively.
Keywords
indium compounds; oxygen; random-access storage; semiconductor thin films; InO; indium oxide films; oxidation reaction; oxygen concentration; resistance switching memory; self-compliance RRAM; variable series resistor; Educational institutions; Indium; Ions; Optical switches; Resistance; Resistors; RRAM; indium oxide; nonvolatile resistance switching memory;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2014.2336676
Filename
6868961
Link To Document