DocumentCode :
608161
Title :
Impact of statistical variability and 3D electrostatics on post-cycling anomalous charge loss in nanoscale Flash memories
Author :
Amoroso, Salvatore Maria ; Gerrer, Louis ; Adamu-Lema, F. ; Markov, Stanislav ; Asenov, Asen
Author_Institution :
Device Modelling Group, Univ. of Glasgow, Glasgow, UK
fYear :
2013
fDate :
14-18 April 2013
Abstract :
This paper presents a detailed simulation investigation of the impact of statistical variability and 3D electrostatics on SILC distribution in nanoscale Flash memories. Considering a 1-TAT model we study the SILC statistics under stationary and dynamic retention conditions. Our results show that SILC is dispersed over the channel area due to non-uniform electrostatics in nanoscale devices. Further, the floating gate poly-silicon granularity plays a major role in determining the SILC distribution, depending on the gate polarity. Dynamic charge loss simulations highlight that the impact of 3D electrostatics is dominant over the cell-to-cell variability. Finally, we analyze the electron emission statistics on a single cell, showing that this gives rise to a lower SILC dispersion than an analytical Poisson charge loss statistics. Our results are fundamental to determine the degree of accuracy of 1D models for the post-cycling charge loss statistics simulation in nanoscale Flash memories.
Keywords :
electrostatics; elemental semiconductors; flash memories; losses; silicon; statistical analysis; stochastic processes; 1-TAT model; 1D models; 3D electrostatics; SILC dispersion; SILC statistics; analytical Poisson charge loss statistics; cell-to-cell variability; channel area; dynamic charge loss simulations; dynamic retention conditions; electron emission statistics; floating gate polysilicon granularity; gate polarity; nanoscale devices; nanoscale flash memories; nonuniform electrostatics; post-cycling anomalous charge loss; post-cycling charge loss statistics simulation; stationary retention conditions; statistical variability impact; Dispersion; Electrostatics; Flash memories; Logic gates; Nanoscale devices; Solid modeling; Three-dimensional displays; Flash memories; SILC; electron emission statistics (EES); retention; semiconductor device modeling; variability;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium (IRPS), 2013 IEEE International
Conference_Location :
Anaheim, CA
ISSN :
1541-7026
Print_ISBN :
978-1-4799-0112-8
Electronic_ISBN :
1541-7026
Type :
conf
DOI :
10.1109/IRPS.2013.6531980
Filename :
6531980
Link To Document :
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