DocumentCode :
608223
Title :
Microscopic origin of random telegraph noise fluctuations in aggressively scaled RRAM and its impact on read disturb variability
Author :
Raghavan, N. ; Degraeve, Robin ; Fantini, Andrea ; Goux, L. ; Strangio, Sebastiano ; Govoreanu, B. ; Wouters, D.J. ; Groeseneken, Guido ; Jurczak, Malgorzata
Author_Institution :
Interuniv. Microelectron. Center (IMEC), Heverlee, Belgium
fYear :
2013
fDate :
14-18 April 2013
Abstract :
Random telegraph noise (RTN) is an important intrinsic phenomenon of any logic or memory device that is indicative of the reliability and stochastic variability in its performance. In the context of the resistive random access memory (RRAM), RTN becomes a key criterion that determines the read disturb immunity and memory window between the low (LRS) and high resistance states (HRS). With the drive towards ultra-low power memory (low reset current) and aggressive scaling to 10 × 10 nm2 area, contribution of RTN is significantly enhanced by every trap (vacancy) in the dielectric. The underlying mechanisms governing RTN in RRAM are yet to be fully understood. In this study, we aim to decode the role of conductance fluctuations caused by oxygen vacancy transport and inelastic electron trapping and detrapping processes. The influence of resistance state (LRS, shallow and deep HRS), reset depth and reset stop voltage (VRESET-STOP) on the conductance variability is also investigated.
Keywords :
electron traps; integrated circuit noise; integrated circuit reliability; random noise; random-access storage; vacancies (crystal); HRS; LRS; RTN; VRESET-STOP; aggressively scaled RRAM; high resistance states; inelastic electron detrapping process; inelastic electron trapping process; low resistance states; memory device; memory window; oxygen vacancy transport; random telegraph noise fluctuations; read disturb variability; reliability; reset depth; reset stop voltage; resistive random access memory; stochastic variability; ultralow power memory; Current measurement; Fluctuations; Hafnium compounds; Market research; Performance evaluation; Resistance; Voltage measurement; Conductive filament; Constriction; Oxygen vacancy; Quantum point contact; Thermochemical model; Trap-Detrap; Variability;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium (IRPS), 2013 IEEE International
Conference_Location :
Anaheim, CA
ISSN :
1541-7026
Print_ISBN :
978-1-4799-0112-8
Electronic_ISBN :
1541-7026
Type :
conf
DOI :
10.1109/IRPS.2013.6532042
Filename :
6532042
Link To Document :
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