DocumentCode :
608226
Title :
Reliability of graphene interconnects and n-type doping of carbon nanotube transistors
Author :
Liyanage, L.S. ; Xiangyu Chen ; Hai Wei ; Hong-Yu Chen ; Mitra, Subhasish ; Wong, H.-S Philip
Author_Institution :
Dept. of Electr. Eng., Stanford Univ., Stanford, CA, USA
fYear :
2013
fDate :
14-18 April 2013
Abstract :
Graphene and carbon nanotubes (CNTs) have gained significant attention due to their potential applications in high performance electronics. In order to replace or integrate the current silicon based technology with carbon based electronics one should study the reliability of those devices to understand the feasibility of their applications. In this report we present the reliability of CVD synthesized graphene for transistor interconnects and also investigate the reliability of a metal-oxide based CNT doping technique that is an active area of research in the current CNT community.
Keywords :
carbon nanotubes; chemical vapour deposition; graphene; interconnections; semiconductor device reliability; semiconductor doping; transistors; CNT community; CVD synthesized graphene reliability; carbon based electronics; carbon nanotube transistors; graphene interconnects; high performance electronics; metal-oxide based CNT doping technique; n-type doping; silicon based technology; transistor interconnects; Current density; Doping; Electric breakdown; Graphene; Reliability; Stress; Wires; Graphene; carbon nanotube; life-time; reliability;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium (IRPS), 2013 IEEE International
Conference_Location :
Anaheim, CA
ISSN :
1541-7026
Print_ISBN :
978-1-4799-0112-8
Electronic_ISBN :
1541-7026
Type :
conf
DOI :
10.1109/IRPS.2013.6532045
Filename :
6532045
Link To Document :
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