DocumentCode :
608247
Title :
Effects of Bosch scallops on metal layer stress of an open Through Silicon Via technology
Author :
Singulani, A.P. ; Ceric, H. ; Langer, E. ; Carniello, S.
Author_Institution :
Inst. for Microelectron., Tech. Univ. Wien, Vienna, Austria
fYear :
2013
fDate :
14-18 April 2013
Abstract :
Through Silicon Via (TSV) is a lead topic in interconnects and 3D integration research, mainly due to numerous anticipated advantages. However, several challenges must still be overcome if large scale production is to be achieved. In this work, we have studied effects of Bosch scallops concerning mechanical reliability for a specific TSV technology. The presence of scallops on the TSV wall modifies the stress distribution along the via. By means of Finite Element Method (FEM) simulations, we could assess this change and understand the process. The achieved results support experiments and give a better insight into the influence of scallops on the stress in an open TSV.
Keywords :
finite element analysis; integrated circuit interconnections; integrated circuit reliability; three-dimensional integrated circuits; 3D integration research; Bosch scallops; FEM simulations; TSV wall; finite element method simulations; interconnects; mechanical reliability; metal layer stress; open Through Silicon Via technology; stress distribution; Geometry; Reliability; Silicon; Stress; Through-silicon vias; Tungsten;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium (IRPS), 2013 IEEE International
Conference_Location :
Anaheim, CA
ISSN :
1541-7026
Print_ISBN :
978-1-4799-0112-8
Electronic_ISBN :
1541-7026
Type :
conf
DOI :
10.1109/IRPS.2013.6532066
Filename :
6532066
Link To Document :
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