Title :
CMOS-compatible silicon double-etched apodized waveguide grating couplers for high efficient coupling
Author :
Chao Li ; Huijuan Zhang ; Mingbin Yu ; Lo, G.Q.
Author_Institution :
Inst. of Microelectron., A*STAR (Agency for Sci., Technol. & Res.), Singapore, Singapore
Abstract :
We experimentally demonstrate a double-etched apodized fiber-to-waveguide grating coupler in silicon-on-insulator for high efficient coupling. The device fabricated using deep UV photolithography exhibits a coupling loss of -1.5 dB with 3-dB bandwidth of 54 nm.
Keywords :
CMOS integrated circuits; diffraction gratings; etching; integrated optoelectronics; optical fibre couplers; optical fibre fabrication; optical fibre losses; silicon-on-insulator; ultraviolet lithography; CMOS-compatible silicon double-etched apodized fibre-to-waveguide grating couplers; Si; coupling loss; deep UV photolithography; high efficient coupling; silicon-on-insulator; Couplers; Couplings; Fiber gratings; Gratings; Lithography; Optical fibers;
Conference_Titel :
Optical Fiber Communication Conference and Exposition and the National Fiber Optic Engineers Conference (OFC/NFOEC), 2013
Conference_Location :
Anaheim, CA
Print_ISBN :
978-1-4799-0457-0
