Author :
Cheben, Pavel ; Schmid, Jens H. ; Xu, Dan-Xia ; Lapointe, J. ; Janz, Siegfried ; Ma, Ronghua ; Delage, A. ; Vachon, M. ; Halir, Robert ; Ortega-Moux, A. ; Alonso-Ramos, C. ; Maese, A. ; Molina-Fernandez, I. ; Fedeli, J.M. ; Ibrahim, Mohammad ; Ye, Winnie
Author_Institution :
OFC/NFOEC, Anaheim, CA, USA
Abstract :
Subwavelenth structures offer exciting new opportunities for integrated optics. Effective refractive index can be chosen from a broad range by lithographic patterning using just two materials. Many practical subwavelength engineered devices already demonstrated, with superior performance compared to their conventional counterparts and likely many more to come.
Keywords :
integrated optics; photolithography; refractive index; effective refractive index; integrated optics; lithographic patterning; practical subwavelength engineered devices; subwavelength structures; Acoustic waveguides; Integrated optics; Optical fibers; Optical polarization; Optimized production technology;
