• DocumentCode
    610585
  • Title

    Impacts of cycle-to-cycle variation effects on the prediction of NBTI degradation and the resulted dynamic variations in high-к MOSFETs

  • Author

    Pengpeng Ren ; Changze Liu ; Runsheng Wang ; Meng Li ; Yangyuan Wang ; Ru Huang

  • Author_Institution
    Inst. of Microelectron., Peking Univ., Beijing, China
  • fYear
    2013
  • fDate
    22-24 April 2013
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    In this paper, the impacts of cycle-to-cycle variation (CCV) effects on the predictions of NBTI degradation and the resulted dynamic variations are studied in highly-scaled high-κ pFETs. By adopting the statistical trap-response (STR) technique, the 2-D distributions and the correlations of key parameters in compact NBTI models due to both device-to-device variation (DDV) and cycle-to-cycle variation (CCV) are extracted. Large error can be found if not considering the CCV effects in predicting the NBTI degradations and resulted time-dependent variations. Different compact NBTI models are also compared for accurate reliability-variability predictions in nanoscale device and circuit design.
  • Keywords
    MOSFET; negative bias temperature instability; statistical analysis; CCV; DDV; NBTI degradation; STR technique; circuit design; cycle-to-cycle variation effects; device-to-device variation; high-κ MOSFET; high-κ pFET; nanoscale device; statistical trap-response technique; Data models; Degradation; Gaussian distribution; Integrated circuit modeling; Predictive models; Reliability; Stress;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Technology, Systems, and Applications (VLSI-TSA), 2013 International Symposium on
  • Conference_Location
    Hsinchu
  • Print_ISBN
    978-1-4673-3081-7
  • Electronic_ISBN
    978-1-4673-6422-5
  • Type

    conf

  • DOI
    10.1109/VLSI-TSA.2013.6545599
  • Filename
    6545599