DocumentCode :
610585
Title :
Impacts of cycle-to-cycle variation effects on the prediction of NBTI degradation and the resulted dynamic variations in high-к MOSFETs
Author :
Pengpeng Ren ; Changze Liu ; Runsheng Wang ; Meng Li ; Yangyuan Wang ; Ru Huang
Author_Institution :
Inst. of Microelectron., Peking Univ., Beijing, China
fYear :
2013
fDate :
22-24 April 2013
Firstpage :
1
Lastpage :
2
Abstract :
In this paper, the impacts of cycle-to-cycle variation (CCV) effects on the predictions of NBTI degradation and the resulted dynamic variations are studied in highly-scaled high-κ pFETs. By adopting the statistical trap-response (STR) technique, the 2-D distributions and the correlations of key parameters in compact NBTI models due to both device-to-device variation (DDV) and cycle-to-cycle variation (CCV) are extracted. Large error can be found if not considering the CCV effects in predicting the NBTI degradations and resulted time-dependent variations. Different compact NBTI models are also compared for accurate reliability-variability predictions in nanoscale device and circuit design.
Keywords :
MOSFET; negative bias temperature instability; statistical analysis; CCV; DDV; NBTI degradation; STR technique; circuit design; cycle-to-cycle variation effects; device-to-device variation; high-κ MOSFET; high-κ pFET; nanoscale device; statistical trap-response technique; Data models; Degradation; Gaussian distribution; Integrated circuit modeling; Predictive models; Reliability; Stress;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology, Systems, and Applications (VLSI-TSA), 2013 International Symposium on
Conference_Location :
Hsinchu
Print_ISBN :
978-1-4673-3081-7
Electronic_ISBN :
978-1-4673-6422-5
Type :
conf
DOI :
10.1109/VLSI-TSA.2013.6545599
Filename :
6545599
Link To Document :
بازگشت