Title :
Optimization of phosphorous diffusion in silicon photocells
Author_Institution :
Fac. of Electron., NTUU KPI, Kiev, Ukraine
Abstract :
Today the main goals for photovoltaic industry are improvement of solar cell parameters and decreasing its cost. Author describes an experiment in manufacturing conditions that proves satisfactory results and achieves the both mentioned goals of photovoltaic industry.
Keywords :
diffusion; elemental semiconductors; optimisation; phosphorus; photoelectric cells; silicon; solar cells; Si:P; optimization; phosphorous diffusion; photovoltaic industry; silicon photocells; solar cell parameters; Optical surface waves; Photovoltaic cells; Silicon; Surface texture; Surface treatment; Surface waves; Temperature; low-temperature diffusion; phosphorous diffusion; photocell; photovoltaics; solar cell;
Conference_Titel :
Electronics and Nanotechnology (ELNANO), 2013 IEEE XXXIII International Scientific Conference
Conference_Location :
Kiev
Print_ISBN :
978-1-4673-4669-6
DOI :
10.1109/ELNANO.2013.6552046
