DocumentCode
614939
Title
Challenges in thin wafer handling and processing
Author
Olson, Stephen ; Hummler, Klaus ; Sapp, Brian
Author_Institution
SEMATECH, Albany, NY, USA
fYear
2013
fDate
14-16 May 2013
Firstpage
62
Lastpage
65
Abstract
Through-silicon via (TSV)-based 3D packaging technologies require processing and handling of silicon wafers thinned to 50 μm and below. A number of manufacturing challenges exist for these processes. When wafers are this thin, an external means of mechanical support is always required. This support may be provided from specially designed chucks, rigid carrier wafers, dicing tape or the final package. Using rigid carrier wafers and a temporary bonding process allows the thin wafers to be processed in regular semiconductor tooling. The number of processes available for temporary bonding as well as the variety of integration flows adds complication to process development in the area. Furthermore, these processing steps require some restructuring of the current semiconductor supply chain.
Keywords
bonding processes; integrated circuit manufacture; integrated circuit packaging; silicon; supply chains; three-dimensional integrated circuits; wafer bonding; 3D packaging technology; dicing tape; integration flows; manufacturing challenges; mechanical support; rigid carrier wafers; semiconductor supply chain; semiconductor tooling; silicon wafers; size 50 mum; temporary wafer bonding; thin wafer handling; through-silicon-via; wafer processing; Assembly; Glass; Silicon; Supply chains; Surface treatment; Three-dimensional displays; Through-silicon vias; 3D; Adhesive; TSV; Temporary wafer bonding; Thin wafer;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Semiconductor Manufacturing Conference (ASMC), 2013 24th Annual SEMI
Conference_Location
Saratoga Springs, NY
ISSN
1078-8743
Print_ISBN
978-1-4673-5006-8
Type
conf
DOI
10.1109/ASMC.2013.6552776
Filename
6552776
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