• DocumentCode
    614941
  • Title

    TSV density impact on 3D power delivery with high aspect ratio TSVs

  • Author

    Huanyu He ; Lu, James Jian-Qiang ; Zheng Xu ; Xiaoxiong Gu

  • Author_Institution
    Dept. of Electr., Rensselaer Polytech. Inst., Troy, NY, USA
  • fYear
    2013
  • fDate
    14-16 May 2013
  • Firstpage
    70
  • Lastpage
    74
  • Abstract
    This paper reports on modeling of the power delivery in TSV-based 3D systems, i.e., vertically integrated ICs with uniformly-distributed high-aspect-ratio through-silicon vias (TSVs). The voltage drop and di/dt noise are modeled to evaluate the impact of TSV density and TSV aspect ratio (AR). The frequency dependency of TSV parasitics is modeled with fullwave EM simulator, and the performance of the power delivery network (PDN) is analyzed in the frequency domain. PDNs with low-AR and high-AR TSVs are compared for trade-off analysis in terms of power delivery performance and TSV area occupation, which is critical for the design of TSV-based 3D power delivery.
  • Keywords
    integrated circuit interconnections; integrated circuit modelling; three-dimensional integrated circuits; PDN; TSV area occupation; TSV aspect ratio; TSV based 3D systems; TSV density; fullwave EM simulator; power delivery network; power delivery performance; through-silicon-via technology; vertically integrated integrated circuits; voltage drop; Integrated circuit modeling; Noise; Power grids; Solid modeling; Three-dimensional displays; Through-silicon vias; Wires; 3D Power delivery; 3D integration; 3D/TSV modeling; IR drop; di/dt noise; through-silicon via (TSV);
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Manufacturing Conference (ASMC), 2013 24th Annual SEMI
  • Conference_Location
    Saratoga Springs, NY
  • ISSN
    1078-8743
  • Print_ISBN
    978-1-4673-5006-8
  • Type

    conf

  • DOI
    10.1109/ASMC.2013.6552778
  • Filename
    6552778