DocumentCode
614941
Title
TSV density impact on 3D power delivery with high aspect ratio TSVs
Author
Huanyu He ; Lu, James Jian-Qiang ; Zheng Xu ; Xiaoxiong Gu
Author_Institution
Dept. of Electr., Rensselaer Polytech. Inst., Troy, NY, USA
fYear
2013
fDate
14-16 May 2013
Firstpage
70
Lastpage
74
Abstract
This paper reports on modeling of the power delivery in TSV-based 3D systems, i.e., vertically integrated ICs with uniformly-distributed high-aspect-ratio through-silicon vias (TSVs). The voltage drop and di/dt noise are modeled to evaluate the impact of TSV density and TSV aspect ratio (AR). The frequency dependency of TSV parasitics is modeled with fullwave EM simulator, and the performance of the power delivery network (PDN) is analyzed in the frequency domain. PDNs with low-AR and high-AR TSVs are compared for trade-off analysis in terms of power delivery performance and TSV area occupation, which is critical for the design of TSV-based 3D power delivery.
Keywords
integrated circuit interconnections; integrated circuit modelling; three-dimensional integrated circuits; PDN; TSV area occupation; TSV aspect ratio; TSV based 3D systems; TSV density; fullwave EM simulator; power delivery network; power delivery performance; through-silicon-via technology; vertically integrated integrated circuits; voltage drop; Integrated circuit modeling; Noise; Power grids; Solid modeling; Three-dimensional displays; Through-silicon vias; Wires; 3D Power delivery; 3D integration; 3D/TSV modeling; IR drop; di/dt noise; through-silicon via (TSV);
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Semiconductor Manufacturing Conference (ASMC), 2013 24th Annual SEMI
Conference_Location
Saratoga Springs, NY
ISSN
1078-8743
Print_ISBN
978-1-4673-5006-8
Type
conf
DOI
10.1109/ASMC.2013.6552778
Filename
6552778
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