DocumentCode :
615005
Title :
Low loss optical interlayer coupling using reflector-enhanced grating couplers
Author :
Jin Yao ; Shubin, Ivan ; Xuezhe Zheng ; Guoliang Li ; Ying Luo ; Thacker, Hiren ; Jin-Hyoung Lee ; Bickford, Justin ; Raj, Kannan ; Cunningham, John E. ; Krishnamoorthy, Ashok V.
Author_Institution :
Oracle Labs., San Diego, CA, USA
fYear :
2013
fDate :
5-8 May 2013
Firstpage :
31
Lastpage :
32
Abstract :
We demonstrate improved optical interlayer coupling based on grating couplers with backside metal reflectors. Losses of 1.5dB and 2.0dB are achieved with 145nm and 220nm grating etch depth on a 130nm SOI CMOS platform, respectively.
Keywords :
CMOS integrated circuits; diffraction gratings; etching; integrated optoelectronics; optical couplers; optical losses; silicon-on-insulator; SOI CMOS platform; Si; backside metal reflectors; depth 145 nm; depth 220 nm; grating etch depth; low loss optical interlayer coupling; reflector-enhanced grating couplers; size 130 nm; Couplers; Couplings; Gratings; Loss measurement; Metals; Optical losses; Optical waveguides;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Optical Interconnects Conference, 2013 IEEE
Conference_Location :
Santa Fe, NM
Print_ISBN :
978-1-4673-5061-7
Electronic_ISBN :
978-1-4673-5062-4
Type :
conf
DOI :
10.1109/OIC.2013.6552909
Filename :
6552909
Link To Document :
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