Title :
Explaining Nondestructive Bond Stress Data From High-Temperature Testing of Au-Al Wire Bonds
Author :
McCracken, Michael James ; Koda, Yasumasa ; Hyoung Joon Kim ; Mayer, M. ; Persic, John ; June Sub Hwang ; Jeong-Tak Moon
Author_Institution :
Microjoining Lab., Univ. of Waterloo, Waterloo, ON, Canada
Abstract :
The application of an alternative method of bond monitoring during high-temperature aging is reported using a custom made test chip with piezoresistive integrated CMOS microsensors located around test bond pads. The sensor detects radial stresses originating from the bond pad and can resolve changes because of intermetallic compound (IMC) formation, voiding, or crack formation at the bond interface. Optimized Au ball bonds are aged for over 2000 h at 175 °C. It is found that stress sensors next to the bonds are capable of showing the stages of IMC growth, consumption of pad Al layers, and monitoring the formation of low-density and Al-rich IMC (AuAl2) which shows an advanced stage of aging. In particular, a first stress signal increase corresponds to the conversion of all Al above the diffusion barrier into IMCs. The second increase in stress signal after a period of stability corresponds to conversion of all Al below the barrier into IMCs. The IMC formation in these periods causes shear strength increase. After complete bond Al consumption, the bond, however, reaches maximum strength. As bond degradation starts, e.g., by lateral IMC formation, voiding, and oxide formation, as well as because of lateral pad Al transformation to IMC, the signal exhibits a strong decrease. The findings are corroborated by results obtained from classical methods such as interruptive or destructive testing including visual inspection, shear testing, cross sectioning, and by bond resistance monitoring.
Keywords :
CMOS integrated circuits; ageing; aluminium; gold; lead bonding; microsensors; nondestructive testing; Au-Al; bond interface; bond monitoring; bond pad; bond resistance monitoring; cross sectioning; destructive testing; detects radial stresses; high-temperature aging; high-temperature testing; intermetallic compound; nondestructive bond stress data; oxide formation; piezoresistive integrated CMOS microsensors; shear testing; stress sensors; temperature 175 C; test chip; visual inspection; wire bonds; Aging; Integrated circuits; Intermetallic; Microsensors; Nondestructive testing; Reliability; Stress; Aging; integrated circuit; intermetallics; reliability; sensor; stress; thermal;
Journal_Title :
Components, Packaging and Manufacturing Technology, IEEE Transactions on
DOI :
10.1109/TCPMT.2013.2262109