DocumentCode
618511
Title
Analytical extraction of via near-field coupling using a multiple scattering approach
Author
Muller, Sebastian ; Hardock, Andreas ; Rimolo-Donadio, Renato ; Bruns, Heinz D. ; Schuster, Christian
Author_Institution
Inst. fur Theor. Elektrotechnik, Tech. Univ. Hamburg-Harburg, Hamburg, Germany
fYear
2013
fDate
12-15 May 2013
Firstpage
1
Lastpage
4
Abstract
This paper studies the near-field coupling between closely spaced vias. The near-field coupling is a consequence of non-propagating (higher order) radial waveguide modes. Although it is a second order effect for typical via geometries in printed circuit boards due to the strong attenuation of these modes with distance, this coupling can become relevant for special cases in high density designs. In this paper we apply a multiple scattering approach to carry out an accurate analysis of two closely coupled vias, and obtain the effective near- and far- end coupling capacitances for this case. An evaluation of the coupling capacitances shows how the near-field coupling depends on the via separation and other geometrical parameters. Based on this evaluation, an empirical formula is provided that allows to estimate the minimum distance above which near-field coupling can be neglected. For typical geometries at board level, the maximum separation to have a noticeable near field coupling is below 30 mil.
Keywords
printed circuit design; vias; waveguides; closely-spaced vias; far-end coupling capacitance; high-density design; higher-order radial waveguide mode; multiple-scattering approach; near-end coupling capacitance; nonpropagating radial waveguide mode; printed circuit boards; via geometry; via near-field coupling; via separation; Capacitance; Cavity resonators; Couplings; Crosstalk; Equivalent circuits; Integrated circuit modeling; Scattering; multiple scattering; near-field coupling; printed circuit board; signal integrity; via coupling;
fLanguage
English
Publisher
ieee
Conference_Titel
Signal and Power Integrity (SPI), 2013 17th IEEE Workshop on
Conference_Location
Paris
Print_ISBN
978-1-4673-5678-7
Type
conf
DOI
10.1109/SaPIW.2013.6558322
Filename
6558322
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