DocumentCode :
618635
Title :
Fabrication of AFM probe with CuO nanowire formed by stress-induced method
Author :
Hosoi, Atsushi ; Koto, Hideyuki ; Yang Ju
Author_Institution :
Dept. of Mech. Sci. & Eng., Nagoya Univ., Nagoya, Japan
fYear :
2013
fDate :
16-18 April 2013
Firstpage :
1
Lastpage :
7
Abstract :
A novel method to fabricate an atomic force microscope (AFM) probe with CuO nanowire was proposed using a stress-induced method which can form nanowire easily. By heating a commercial AFM probe which is eliminated its tip and is coated with Ta and Cu films, Cu hillock and CuO nanowires on the hillock can be formed at the probe end. To obtain the CuO nanowire of high aspect ratio that can use as an AFM probe tip, thickness of coating films, heating temperature and heating time were investigated. As the result, the probe tip approximately 5 μm high and the nanowire approximately 25 nm in diameter were successfully obtained. In the results that the measurement resolution was evaluated, the measurement resolution of the CuO nanowire probe slightly worse than that of a commercial AFM probe. However, from the viewpoint of the dimensional measurement, the precision was almost equal between both probes.
Keywords :
atomic force microscopy; copper; copper compounds; metallic thin films; nanofabrication; nanowires; probes; protective coatings; tantalum; AFM probe; Cu; Cu films; Cu hillock; CuO; CuO nanowire; Ta; Ta films; atomic force microscope probe; coating films; dimensional measurement; measurement resolution; stress induced method; Fabrication; Films; Heating; Probes; Silicon; Stress; Temperature measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Design, Test, Integration and Packaging of MEMS/MOEMS (DTIP), 2013 Symposium on
Conference_Location :
Barcelona
Print_ISBN :
978-1-4673-4477-7
Type :
conf
Filename :
6559420
Link To Document :
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