Title :
UV-Sensitive Low Dark-Count PureB Single-Photon Avalanche Diode
Author :
Lin Qi ; Mok, K.R.C. ; Aminian, M. ; Charbon, E. ; Nanver, Lis K.
Author_Institution :
Delft Univ. of Technol., Delft, Netherlands
Abstract :
A single-photon avalanche diode with high sensitivity in the ultraviolet (UV) wavelength range has been fabricated on Si using pure boron chemical vapor deposition to create both a nanometer-thin anode junction and a robust light entrance window. The device shows high sensitivity at the wavelengths of 330-370 nm when operated in the Geiger mode and good selectivity for UV light without applying a capping filter. The dark count rates can be as low as 5 Hz at room temperature for an active area of 7 μm2. An implicit guard ring, using an n-enhancement implantation in the central region of the diode, is applied instead of peripheral diffused p-type guard rings to achieve a high fill factor.
Keywords :
avalanche photodiodes; boron; chemical vapour deposition; optical fabrication; B; Geiger mode; Si; UV light; UV-sensitive low dark-count pure boron single-photon avalanche diode; active area; dark count rate; fill factor; n-enhancement implantation; nanometer-thin anode junction; peripheral diffused p-type guard rings; pure boron chemical vapor deposition; robust light entrance window; temperature 293 K to 298 K; ultraviolet wavelength range; wavelength 330 nm to 370 nm; Anodes; Electric breakdown; Junctions; Photonics; Silicon; Temperature measurement; Voltage measurement; Avalanche breakdown; Geiger-mode avalanche photodiode; boron; chemical vapor deposition (CVD); single-photon avalanche diode (SPAD); ultrashallow junctions; ultraviolet (UV);
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/TED.2014.2351576