DocumentCode :
618796
Title :
Bismuth doped ZnO films as anti-reflection coatings for solar cells
Author :
Fangsuwannarak, T. ; Krongarrom, P. ; Kaewphoka, J. ; Rattanachan, S.T.
Author_Institution :
Sch. of Electr. Eng., Suranaree Univ. of Technol., Nakhon Ratchasima, Thailand
fYear :
2013
fDate :
15-17 May 2013
Firstpage :
1
Lastpage :
5
Abstract :
For fabrication of zinc oxide-based optoelectronic devices, especially solar cells, the development of cost-effective and low-temperature synthesis techniques for the deposition of high quality ZnO films is paramount. In this paper, incorporating Bi-doped ZnO films was prepared by the sol-gel spin coating method. The optical constants of the prepared thin films depend on the synthesis conditions. XRD measurement show that a high quality of ZnO:Bi nanostructure have preferably grow along (002) direction. The ZnO:Bi thin films were fabricated as antireflection coatings (ARCs) for solar cells. The nanoscale morphology altered through the different Bi content in the films, has a great effect on the macroscopic ARC performance. The optical constants as refractive index and extinction coefficient are determined through the transmittance and reflectance spectra. Textured ZnO:Bi films with average thickness ranging from 87 nm to 94 nm present a broadband reflection suppression from 400 to 1100 nm wavelength. The refractive index around 1.31-1.47 estimated is appropriate to an ARC layer for Si solar cells.
Keywords :
II-VI semiconductors; antireflection coatings; bismuth; electrodes; refractive index; sol-gel processing; solar cells; spin coating; zinc compounds; ARC layer; Si; ZnO:Bi; antireflection coating; extinction coefficient; macroscopic ARC performance; optical constants; reflection suppression; refractive index; size 87 nm to 94 nm; sol-gel spin coating method; solar cells; wavelength 400 nm to 1100 nm; zinc oxide based optoelectronic device; Coatings; Nanoscale devices; Optical films; Optical reflection; Optical refraction; Zinc oxide; Zinc oxide; anti-reflection coating; nanocrystal; texturization;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electrical Engineering/Electronics, Computer, Telecommunications and Information Technology (ECTI-CON), 2013 10th International Conference on
Conference_Location :
Krabi
Print_ISBN :
978-1-4799-0546-1
Type :
conf
DOI :
10.1109/ECTICon.2013.6559582
Filename :
6559582
Link To Document :
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