Measurement method of light transmittance of layered metal-dielectric metamaterial

Author

Isozaki, Akihiro ; Kan, Tianze ; Matsumoto, Kaname ; Shimoyama, Isao

Author_Institution

Dept. of Mechano-Inf., Univ. of Tokyo, Tokyo, Japan

fYear

2013

fDate

7-10 April 2013

Firstpage

151

Lastpage

154

Abstract

We propose a measurement method of light transmittance of metamaterials by directly contacting the metamaterial on a Si photodiode. Our measurement method enables direct detection of not only the propagation wave component but also the evanescent wave component through the metamaterial. In this paper, we fabricated a layered metal-dielectric metamaterial composed of Ag/Al₂O₃ layers on the Si photodiode. The transmittance property of evanescent wave was measured. This result indicates that our measurement system detects evanescent wave transferred through the fabricated metamaterial.

Keywords

elemental semiconductors; measurement systems; metamaterials; photodiodes; silicon; Ag-alumina layers; Si; Si photodiode; direct detection; evanescent wave component; layered metal-dielectric metamaterial; measurement method; measurement system; metamaterial light transmittance; propagation wave component; transmittance property; Gratings; Lenses; Magnetic materials; Metamaterials; Optical surface waves; Photodiodes; Silicon; evanescent wave; metamaterial; perfect lens; photodiode;

fLanguage

English

Publisher

ieee

Conference_Titel

Nano/Micro Engineered and Molecular Systems (NEMS), 2013 8th IEEE International Conference on

Conference_Location

Suzhou

Electronic_ISBN

978-1-4673-6351-8

Type

conf

DOI

10.1109/NEMS.2013.6559702

Filename

6559702