Title :
Development of cluster ion source based on modulated pulse power magnetron sputtering technique
Author :
Zhang, Clara H. ; Tsunoyama, H. ; Akatsuka, Hiroshi ; Sekiya, Hiroo ; Nagase, Tomohiro ; Nakajima, Akitoshi
Author_Institution :
Nakajima Designer Nanocluster Assembly Project, JST ERATO, Kawasaki, Japan
Abstract :
A new ion source based on modulated pulse power (MPP) magnetron sputtering (MSP) was developed and demonstrated for cluster production. By employing MPP-MSP, both silver and silicon cluster beams were produced and analyzed by a quadrupole mass spectrometer. It is found that the maximum intensity of silver cluster anions reaches 500 pA, which is considerably higher than that with a conventional DC-MSP. For silicon cluster cation, the overall ion intensity of the cluster beam by MPP-MSP is about three times higher than that generated by DC-MSP.
Keywords :
atomic clusters; elemental semiconductors; ion sources; mass spectra; negative ions; positive ions; silicon; silver; sputtering; Ag; Si; cluster ion source development; cluster production; maximum intensity; modulated pulse power magnetron sputtering technique; overall ion intensity; quadrupole mass spectrometer; silicon cluster beam; silicon cluster cation; silver cluster anions; silver cluster beam; Argon; Discharges (electric); Magnetic flux; Plasmas; Production; Silicon; Sputtering; cluster source; high power impulse magnetron sputtering; mass spectroscopy; modulated pulse power;
Conference_Titel :
Nano/Micro Engineered and Molecular Systems (NEMS), 2013 8th IEEE International Conference on
Conference_Location :
Suzhou
Electronic_ISBN :
978-1-4673-6351-8
DOI :
10.1109/NEMS.2013.6559764
