Metal-catalyst free integration of SiO2 nanowires into carbon MEMS

Author

Liangliang Xu ; Tielin Shi ; Shuang Xi ; Hu Long ; Shiyuan Liu ; Zirong Tang

Author_Institution

State Key Lab. of Digital Manuf. Equip. & Technol., Huazhong Univ. of Sci. & Technol., Wuhan, China

fYear

2013

fDate

7-10 April 2013

Firstpage

734

Lastpage

737

Abstract

This paper presents an innovative technique of integrating silica nanowires to photoresist-derived carbon microelectromechanical systems (C-MEMS) on silicon substrate. The silica nanowires were synthesized through thermal treatment in a tube furnace at 1200 °C under a gaseous environment of N₂ and H₂. The stiff morphology and radicalized distribution around carbon posts of nanowires was observed, which was different from much of the previous studies. High-temperature annealing and meticulous-controlled pyrolying atmosphere could be the causes of the formation of unusual SiO₂/C-MEMS integrated structures.

Keywords

annealing; furnaces; micromechanical devices; nanowires; photoresists; silicon compounds; Si; SiO₂; carbon MEMS; gaseous environment; high-temperature annealing; metal-catalyst free integration; meticulous-controlled pyrolying atmosphere; photoresist-derived C-MEMS; photoresist-derived carbon microelectromechanical systems; radicalized distribution; silica nanowires; silica-C-MEMS integrated structures; silicon dioxide nanowires; silicon substrate; stiff morphology; temperature 1200 degC; thermal treatment; tube furnace; Carbon; Lithography; Nanowires; Resists; Silicon; Silicon compounds; C-MEMS; metal-catalyst free; silica nanowires;

fLanguage

English

Publisher

ieee

Conference_Titel

Nano/Micro Engineered and Molecular Systems (NEMS), 2013 8th IEEE International Conference on

Conference_Location

Suzhou

Electronic_ISBN

978-1-4673-6351-8

Type

conf

DOI

10.1109/NEMS.2013.6559833

Filename

6559833