DocumentCode
619137
Title
MOS tunneling strain sensor using an AC measurement technique
Author
Li Zhu ; Dharmasena, Ruchira ; McNamara, Shamus
Author_Institution
Dept. of Electr. & Comput. Eng., Univ. of Louisville, Louisville, KY, USA
fYear
2013
fDate
7-10 April 2013
Firstpage
1159
Lastpage
1162
Abstract
The increasing requirement for low power sensors is motivating research on new techniques. MOS tunneling sensors consume only nW of power, compared to typical piezoresistive and capacitive sensors which consumes μW to mW. The strain was measured by measuring the tunneling current through a Metal-Oxide-Semiconductor sandwich from a DC voltage. To overcome the electronic noise, substantial averaging was utilized. In this paper an improved method of measuring the strain from the tunneling current is demonstrated in which an AC signal is utilized, and the AC current is measured. This approach substantially reduces the noise by avoiding the 1/f noise. The optimal conditions for the AC technique are to use a high frequency to avoid 1/f noise and a low DC bias.
Keywords
MIS devices; electric current measurement; strain measurement; strain sensors; 1/f noise; AC current; AC measurement technique; AC signal; DC voltage; MOS tunneling strain sensor; capacitive sensors; electronic noise; low power sensors; metal-oxide-semiconductor sandwich; piezoresistive sensors; strain measurement; tunneling current measurement; Current measurement; Noise; Sensors; Strain; Strain measurement; Tunneling; Voltage measurement; 1/f noise; AC; MOS tunneling; strain sensor;
fLanguage
English
Publisher
ieee
Conference_Titel
Nano/Micro Engineered and Molecular Systems (NEMS), 2013 8th IEEE International Conference on
Conference_Location
Suzhou
Electronic_ISBN
978-1-4673-6351-8
Type
conf
DOI
10.1109/NEMS.2013.6559927
Filename
6559927
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