• DocumentCode
    619137
  • Title

    MOS tunneling strain sensor using an AC measurement technique

  • Author

    Li Zhu ; Dharmasena, Ruchira ; McNamara, Shamus

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Univ. of Louisville, Louisville, KY, USA
  • fYear
    2013
  • fDate
    7-10 April 2013
  • Firstpage
    1159
  • Lastpage
    1162
  • Abstract
    The increasing requirement for low power sensors is motivating research on new techniques. MOS tunneling sensors consume only nW of power, compared to typical piezoresistive and capacitive sensors which consumes μW to mW. The strain was measured by measuring the tunneling current through a Metal-Oxide-Semiconductor sandwich from a DC voltage. To overcome the electronic noise, substantial averaging was utilized. In this paper an improved method of measuring the strain from the tunneling current is demonstrated in which an AC signal is utilized, and the AC current is measured. This approach substantially reduces the noise by avoiding the 1/f noise. The optimal conditions for the AC technique are to use a high frequency to avoid 1/f noise and a low DC bias.
  • Keywords
    MIS devices; electric current measurement; strain measurement; strain sensors; 1/f noise; AC current; AC measurement technique; AC signal; DC voltage; MOS tunneling strain sensor; capacitive sensors; electronic noise; low power sensors; metal-oxide-semiconductor sandwich; piezoresistive sensors; strain measurement; tunneling current measurement; Current measurement; Noise; Sensors; Strain; Strain measurement; Tunneling; Voltage measurement; 1/f noise; AC; MOS tunneling; strain sensor;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nano/Micro Engineered and Molecular Systems (NEMS), 2013 8th IEEE International Conference on
  • Conference_Location
    Suzhou
  • Electronic_ISBN
    978-1-4673-6351-8
  • Type

    conf

  • DOI
    10.1109/NEMS.2013.6559927
  • Filename
    6559927