Bilayer wire-grid polarizers for DUV to IR fabricated using EUV interference and nanoimprint lithography

Author

Li Wang ; Schift, Helmut ; Kristiansen, Per Magnus ; Jefimovs, Konstantins ; Solak, Harun H. ; Gobrecht, Jens ; Ekinci, Y.

Author_Institution

Lab. for Microand Nanotechnol., Paul Scherrer Inst., Villigen, Switzerland

fYear

2013

fDate

7-10 April 2013

Firstpage

1232

Lastpage

1235

Abstract

We present the design of a bilayer metallic wire-grid polarizer (WGP) optimized for operation in the deep-ultraviolet (DUV) region, and their high-throughput fabrication of over large areas by nanoimprint lithography (NIL). The master imprint stamps were fabricated using our newly developed scanning exposure strategy with extreme ultraviolet interference lithography (EUV-IL). Optical measurements show that the fabricated bi-layer polarizer covers a broad spectral range, starting from wavelength of 280 nm. TM transmission of 50%, and an extinction ratio of 20 dB (10²) were realized.

Keywords

electromagnetic wave interference; nanofabrication; nanolithography; optical variables measurement; soft lithography; DUV region; EUV interference; EUV-IL; IR fabrication; NIL; TM transmission; WGP; bilayer metallic wire-grid polarizer; broad spectral range; deep-ultraviolet region; high-throughput fabrication; master imprint stamps; nanoimprint lithography; optical measurements; scanning exposure strategy; ultraviolet interference lithography; Extinction ratio; Fabrication; Gratings; Lithography; Polymers; Silicon; Ultraviolet sources; EUV; Interference; lithography; nanoimprint; wire-grid polarizer (WGP);

fLanguage

English

Publisher

ieee

Conference_Titel

Nano/Micro Engineered and Molecular Systems (NEMS), 2013 8th IEEE International Conference on

Conference_Location

Suzhou

Electronic_ISBN

978-1-4673-6351-8

Type

conf

DOI

10.1109/NEMS.2013.6559941

Filename

6559941