Title :
Predicting future product performance: Modeling and evaluation of standard cells in FinFET technologies
Author :
Kleeberger, Veit B. ; Graeb, Helmut ; Schlichtmann, Ulf
Author_Institution :
Inst. for Electron. Design Autom., Tech. Univ. Munchen, Munich, Germany
fDate :
May 29 2013-June 7 2013
Abstract :
With continued scaling of CMOS technology it becomes increasingly difficult to maintain reliable circuits. Early predictive technology and design exploration help to understand major effects of variability sources and their impact on circuit performances. With each new technology basic circuit blocks have to be redesigned to appropriately evaluate the impact of technology scaling. Therefore, this paper presents an approach which is able to find the optimal sizing of basic circuit blocks considering process variation. We utilize this approach to predict the impact of scaling in FinFET technologies and the influence of process variations in future technology nodes.
Keywords :
MOSFET; semiconductor device models; semiconductor device reliability; CMOS technology; FinFET technology; circuit reliability; design exploration; optimal sizing; process variation; product performance prediction; standard cell evaluation; standard cell modeling; technology basic circuit blocks; technology scaling; variability source; Delays; FinFETs; Integrated circuit modeling; Logic gates; Optimization; Predictive models; FinFET; NBTI; discrete sizing; predictive modeling; process variations; standard cells;
Conference_Titel :
Design Automation Conference (DAC), 2013 50th ACM/EDAC/IEEE
Conference_Location :
Austin, TX