A novel fuzzy matching model for lithography hotspot detection

Author

Sheng-Yuan Lin ; Jing-Yi Chen ; Jin-cheng Li ; Wan-Yu Wen ; Shih-Chieh Chang

Author_Institution

Dept. of Comput. Sci., Nat. Tsing Hua Univ., Hsinchu, Taiwan

fYear

2013

fDate

May 29 2013-June 7 2013

Firstpage

1

Lastpage

6

Abstract

In advanced IC manufacturing, as the gap between lithography optical wavelength and feature size increases, it becomes challenging to detect problematic layout patterns called lithography hotspot. In this paper, we propose a novel fuzzy matching model which can dynamically tune appropriate fuzzy regions around known hotspots. Based on this model, we develop a fast algorithm for lithography hotspot detection with very low chances of false-alarm. Our results are very encouraging with under 0.56 CPU-hrs/mm² runtime.

Keywords

design for manufacture; fuzzy set theory; integrated circuit manufacture; lithography; semiconductor process modelling; advanced integrated circuit manufacturing; fuzzy matching model; fuzzy regions; lithography hotspot detection; problematic layout patterns; Accuracy; Benchmark testing; Encoding; Integrated circuit modeling; Layout; Lithography; Pattern matching; Design for Manufacturability; Fuzzy Matching; Hotspot Detection; Lithography Hotspot; Machine Learning;

fLanguage

English

Publisher

ieee

Conference_Titel

Design Automation Conference (DAC), 2013 50th ACM/EDAC/IEEE

Conference_Location

Austin, TX

ISSN

0738-100X

Type

conf

Filename

6560661