DocumentCode :
620676
Title :
A novel GaN-based monolithic SAW/HEMT oscillator on silicon
Author :
Xing Lu ; Jun Ma ; Xue Liang Zhu ; Chi Ming Lee ; Yue, C. Patrick ; Kei May Lau
Author_Institution :
Electron. & Comput. Eng. Dept., Hong Kong Univ. of Sci. & Technol., Kowloon, China
fYear :
2012
fDate :
7-10 Oct. 2012
Firstpage :
2206
Lastpage :
2209
Abstract :
This work presents the first fully integrated surface acoustic wave (SAW) oscillator based on AIGaN/GaN structures grown on Si substrates. In addition to the material advantages such as wide-bandgap, and chemical and thermal stability, the use of crystalline III-nitride semiconductors enables a seamless integration of an acoustic device with its peripheral control circuits. The 252-MHz oscillator prototype was implemented by monolithically integrating a two-port SAW delay line with electronics using AIGaN/GaN high electron mobility transistors (HEMTs). Measurements show that the SAW device exhibits a high quality factor (Q) of up to 1000 and an excellent power handling capability. The oscillator is suitable for sensing applications in harsh environments and can potentially be extended to high power RF systems.
Keywords :
III-V semiconductors; Q-factor; VHF oscillators; aluminium compounds; elemental semiconductors; gallium compounds; high electron mobility transistors; semiconductor growth; silicon; surface acoustic wave oscillators; thermal stability; wide band gap semiconductors; AlGaN-GaN; HEMT oscillator; Q-factor; Si; acoustic device; chemical stability; crystalline III-nitride semiconductors; frequency 252 MHz; fully integrated surface acoustic wave oscillator; high electron mobility transistors; high power RF systems; high quality factor; monolithic SAW oscillator; peripheral control circuits; thermal stability; two-port SAW delay line; wide-band gap semiconductor; Electrodes; Epitaxial growth; Gallium nitride; Nickel; Performance evaluation; Surface acoustic waves; AlGaN/GaN; HEMT; monolithic integration; oscillator; sensor; surface acoustic wave;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Ultrasonics Symposium (IUS), 2012 IEEE International
Conference_Location :
Dresden
ISSN :
1948-5719
Print_ISBN :
978-1-4673-4561-3
Type :
conf
DOI :
10.1109/ULTSYM.2012.0551
Filename :
6561917
Link To Document :
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