DocumentCode :
620685
Title :
Novel thin-film piezoelectric aluminum nitride rate gyroscope
Author :
Goericke, Fabian T. ; Vigevani, Gabriele ; Izyumin, I.I. ; Boser, Bernhard E. ; Pisano, Albert P.
Author_Institution :
Berkeley Sensor & Actuator Center, Univ. of California, Berkeley, Berkeley, CA, USA
fYear :
2012
fDate :
7-10 Oct. 2012
Firstpage :
1067
Lastpage :
1070
Abstract :
A new type of gyroscope that utilizes piezoelectric, thin-film, sputter-deposited aluminum nitride (AlN) as both structural and active material is demonstrated. Advantages of this approach are the capability to integrate several types of sensors and RF resonators on one chip in a post-CMOS compatible fabrication process and the potential of an all-AlN device to operate at high temperatures. A method to drive and sense specific resonance mode shapes by patterning the top electrode is explained and electrical and rate sensing performance characteristics of the device are stated.
Keywords :
CMOS integrated circuits; III-V semiconductors; aluminium compounds; gyroscopes; microelectrodes; microfabrication; microsensors; piezoelectric transducers; sputter deposition; thin film sensors; AlN; RF resonators; active material; electrical sensing performance characteristics; post-CMOS compatible fabrication process; rate sensing performance characteristics; sensors; sputter-deposited aluminum nitride; structural material; thin-film piezoelectric aluminum nitride rate gyroscope; top electrode patterning; Aluminum nitride; Capacitance; Electrodes; Gyroscopes; III-V semiconductor materials; Resonant frequency; Temperature sensors; Aluminum nitride; MEMS gyroscope; harsh environment; piezoelectric inertial sensor;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Ultrasonics Symposium (IUS), 2012 IEEE International
Conference_Location :
Dresden
ISSN :
1948-5719
Print_ISBN :
978-1-4673-4561-3
Type :
conf
DOI :
10.1109/ULTSYM.2012.0267
Filename :
6561935
Link To Document :
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