• DocumentCode
    625386
  • Title

    HF mismatch characterization and modeling of bipolar transistors for RFIC design

  • Author

    Tzung-yin Lee ; Yuh-yue Chen

  • Author_Institution
    Skyworks Solutions, Inc., Irvine, CA, USA
  • fYear
    2013
  • fDate
    2-4 June 2013
  • Firstpage
    49
  • Lastpage
    52
  • Abstract
    This paper presents a methodology to characterize and model BJT´s mismatch behavior for RFIC design. A measurement technique based on the conventional S-parameter measurement is developed to measure the mismatch behavior at high frequencies (HFs). First, besides the typical de-embedding, the bondpad mismatch is subtracted statistically from the capacitance mismatch measurement. Second, a semi-empirical methodology using physical parameters, such as window CD and vertical doping, is developed to model the measured AC mismatch behavior for transistors of different size. Finally, a systematic procedure is proposed to extract the mismatch parameters, which can be used in the SPICE Monte-Carlo mismatch simulation. The proposed mismatch modeling methodology is validated on an industrial 0.35μm RF BiCMOS process. The proposed model fits the mismatch characteristics of the key AC parameters, such as CBE, CBC, and fT at different current densities. The model also scales well with geometry for the transistors with sizes useful for RFIC application.
  • Keywords
    BiCMOS integrated circuits; Monte Carlo methods; S-parameters; SPICE; bipolar transistors; capacitance measurement; integrated circuit design; integrated circuit modelling; radiofrequency integrated circuits; semiconductor doping; BJT; HF mismatch characterization; RF BiCMOS process; RFIC design; S-parameter measurement; SPICE Monte-Carlo mismatch simulation; bipolar transistor modeling; bondpad mismatch; capacitance mismatch measurement; measurement technique; mismatch behavior measurement; mismatch modeling methodology; mismatch parameter extraction; physical parameter; semiempirical methodology; size 0.35 mum; systematic procedure; vertical doping; window CD; Capacitance; Integrated circuit modeling; Mathematical model; Radio frequency; Radiofrequency integrated circuits; Scattering parameters; Transistors; Bipolar modeling; RF circuit design; mismatch modeling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Radio Frequency Integrated Circuits Symposium (RFIC), 2013 IEEE
  • Conference_Location
    Seattle, WA
  • ISSN
    1529-2517
  • Print_ISBN
    978-1-4673-6059-3
  • Type

    conf

  • DOI
    10.1109/RFIC.2013.6569519
  • Filename
    6569519