Title :
Composition and work function relationship in Os-Ru-W ternary alloys
Author :
Swartzentruber, Phillip ; Balk, T. John ; Roberts, Sean ; Effgen, Michael
Author_Institution :
Dept. of Chem. & Mater. Eng., Univ. of Kentucky Lexington, Lexington, KY, USA
Abstract :
Os-Ru thin films with varying concentrations of W were sputter deposited on Mo-Re substrates. The films were analyzed with XRD to investigate their crystal structures and a Kelvin Probe to investigate their work functions. A film with ~30 at.% W yielded a work function maximum of approximately 5.15 eV.
Keywords :
X-ray diffraction; crystal structure; osmium alloys; ruthenium alloys; sputter deposition; thin films; tungsten alloys; work function; Kelvin probe; Os-Ru-W; XRD; crystal structures; sputter deposition; ternary alloys; thin films; work function; Cathodes; Coatings; Crystals; Films; Metals; Substrates; X-ray scattering; Os-Ru; microstructure; ternary alloy; work function;
Conference_Titel :
Vacuum Electronics Conference (IVEC), 2013 IEEE 14th International
Conference_Location :
Paris
Print_ISBN :
978-1-4673-5976-4
DOI :
10.1109/IVEC.2013.6571111
