• DocumentCode
    626173
  • Title

    Recent development on the modeling of electrical contact

  • Author

    Peng Zhang ; Lau, Y.Y.

  • Author_Institution
    Dept. of Nucl. Eng. & Radiol. Sci., Univ. of Michigan, Ann Arbor, MI, USA
  • fYear
    2013
  • fDate
    21-23 May 2013
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    Contact problems account for 40 percent of all electrical/electronic failures, ranging from small scale consumer electronic devices to large scale military and aerospace systems. This paper summarizes recent development on the theory of bulk contact and thin-film contacts, whose contact members may possess vastly different electrical resistivities. Current crowding at the rim of an electrode, scaling laws for contact resistance in a general geometry, and the novel relation between AC bulk contact resistance and DC thin film contact resistance are addressed.
  • Keywords
    electrical contacts; failure analysis; thin films; AC bulk contact resistance; DC thin film contact resistance; bulk contact theory; electrical contact modeling; electrical resistivities; electrical-electronic failures; electrode; large scale aerospace systems; large scale military systems; small scale consumer electronic devices; Contact resistance; Electrodes; Materials; Proximity effects; Resistance; Skin; Current crowding; contact resistance; skin depth; spreading resistance;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Electronics Conference (IVEC), 2013 IEEE 14th International
  • Conference_Location
    Paris
  • Print_ISBN
    978-1-4673-5976-4
  • Type

    conf

  • DOI
    10.1109/IVEC.2013.6571177
  • Filename
    6571177