DocumentCode :
62760
Title :
Experimental and Simulation Investigations of DBD Plasma Reactor at Normal Environmental Conditions
Author :
Eid, Ahmad ; Takashima, Katsuyuki ; Mizuno, Akira
Author_Institution :
Dept. of Electr. Eng., Aswan Univ., Aswan, Egypt
Volume :
50
Issue :
6
fYear :
2014
fDate :
Nov.-Dec. 2014
Firstpage :
4221
Lastpage :
4227
Abstract :
In this paper, a cylindrical dielectric barrier discharge (DBD) plasma reactor is analyzed and investigated at normal environmental conditions. The stressed voltage is varied up to 40 kV peak-to-peak with a variable frequency of up to 4 kHz. In order to compare the experimental findings with the simulation results, an equivalent electrical circuit model is used. To simulate the dynamic microdischarge inside the plasma reactor, a voltage-controlled current source is implemented. The reactor is filled with aluminum oxide to enhance its operation. An equivalent configuration is proposed to model the region of alumina pellets inside the reactor and to calculate the corresponding equivalent capacitance. It is found that the measured voltage, discharge current, and voltage-charge waveforms are consistent with the simulated results. The quantitative comparison of the experimental and simulated data confirms the validity of the developed electrical circuit model of the plasma reactor.
Keywords :
alumina; dielectric-barrier discharges; equivalent circuits; plasma confinement; plasma dielectric properties; plasma simulation; Al2O3; DBD plasma reactor; alumina pellet region; cylindrical dielectric barrier discharge plasma reactor; discharge current; dynamic microdischarge; equivalent capacitance; equivalent configuration; equivalent electrical circuit model; frequency 4 kHz; normal environmental conditions; stressed voltage; voltage 40 kV; voltage-charge waveforms; voltage-controlled current source; Capacitance; Capacitors; Discharges (electric); Inductors; Mathematical model; Plasmas; Capacitance; dielectric barrier discharge (DBD) reactor; discharge power; microdischarge;
fLanguage :
English
Journal_Title :
Industry Applications, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-9994
Type :
jour
DOI :
10.1109/TIA.2014.2315496
Filename :
6782744
Link To Document :
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