DocumentCode :
627891
Title :
Smart Photolithography
Author :
Rajagopalan, Satish ; Lei Yang ; DeMarco, Robert M. ; Gomez Brule, Rafael ; Perez-Castillejos, Raquel
Author_Institution :
Tissue Models Lab., New Jersey Inst. of Technol. (NJIT), Newark, NJ, USA
fYear :
2013
fDate :
5-7 April 2013
Firstpage :
76
Lastpage :
77
Abstract :
We introduce here an approach for determining the exposure time in photolithography. A script was developed in LabVIEW that (i) measures (via UV sensor) the intensity (or power) of UV light to which a sample is exposed at different times, (ii) calculates the total energy delivered onto the sample, and (iii) switches off the UV lamp as soon as the sample (a photocurable material) has received the targeted total energy of UV light. In comparison to standard approaches to photolithography in which the lamp is switched off after a given amount of time pre-selected by the user, our approach determines experimentally the energy received by the sample and switches the UV lamp off when the sample has received the intended UV energy -- independently of how long it took for the lamp to produce that amount of energy.
Keywords :
biological techniques; lamps; optical sensors; photolithography; virtual instrumentation; LabVIEW; photocurable material; photolithography; script; ultraviolet energy calculation; ultraviolet light intensity; ultraviolet light lamp; ultraviolet light power; ultraviolet sensor; Computers; Energy measurement; Lithography; Materials; Ports (Computers); Strips; Universal Serial Bus; LabVIEW; automation; photolithography; photoresist;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Bioengineering Conference (NEBEC), 2013 39th Annual Northeast
Conference_Location :
Syracuse, NY
ISSN :
2160-7001
Print_ISBN :
978-1-4673-4928-4
Type :
conf
DOI :
10.1109/NEBEC.2013.138
Filename :
6574365
Link To Document :
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