DocumentCode :
628395
Title :
Low-loss design and fabrication of multimode polymer optical waveguide circuit with crossings for high-density optical PCB
Author :
Ishigure, Takaaki ; Shitanda, Keishiro ; Kudo, Takahiro ; Takayama, S. ; Mori, Takayoshi ; Moriya, Kazuyuki ; Choki, Koji
Author_Institution :
Fac. of Sci. & Technol., Keio Univ., Yokohama, Japan
fYear :
2013
fDate :
28-31 May 2013
Firstpage :
297
Lastpage :
304
Abstract :
In this paper, we both theoretically and experimentally demonstrate that 90 % lower optical loss is realized with multimode crossed polymer optical waveguides by introducing graded-index (GI) cores, compared to conventional step-index (SI) core counterparts. First, the light leakage losses of crossed waveguides with SI and GI cores are simulated using a ray-trace simulation. Then, we show that a drastic reduction of the leakage loss is achieved in the GI-core crossed waveguide (only a loss of 0.095 dB for 50 perpendicular crossings), which is less than one-tenth of the leakage loss in the SI-core crossed waveguide (2.5-dB loss for the same 50 perpendicular crossings). Furthermore, even in the GI-core crossed waveguide with a 30-degree crossing angle, the leakage-loss is calculated to be only 0.009 dB/crossing, while 0.086 dB/crossing for the SI-core. This low loss of GI crossed core waveguides stems from the tight optical-field confinement in GI cores. Next, we confirm the validity of the calculated results. We fabricate the GI-core polymer crossed waveguides (multiple crossings) using the photo-address method for the first time to the best of our knowledge. In this method, we use a polynorbornene resin whose refractive index could be controlled by intensity variations of UV exposure during the curing process. The experimental results in the crossed waveguide with GI profile show a very good agreement with the calculated result.
Keywords :
optical fabrication; optical losses; optical waveguides; printed circuits; ray tracing; refractive index; resins; GI-core polymer crossed waveguides; SI cores; UV exposure; graded-index core; high-density optical PCB; light leakage losses; low-loss design; multimode crossed polymer optical waveguides; multimode polymer optical waveguide circuit; optical loss; optical-field confinement; photo-address method; polynorbornene resin; ray-trace simulation; refractive index; step-index core counterparts; Loss measurement; Optical device fabrication; Optical losses; Optical refraction; Optical waveguides; Polymers; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic Components and Technology Conference (ECTC), 2013 IEEE 63rd
Conference_Location :
Las Vegas, NV
ISSN :
0569-5503
Print_ISBN :
978-1-4799-0233-0
Type :
conf
DOI :
10.1109/ECTC.2013.6575587
Filename :
6575587
Link To Document :
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