DocumentCode :
628478
Title :
Use of compliant interconnects for drop impact isolation
Author :
Wei Chen ; Bhat, Aruna ; Sitaraman, Suresh K.
Author_Institution :
George W. Woodruff Sch. of Mech. Eng., Georgia Inst. of Technol., Atlanta, GA, USA
fYear :
2013
fDate :
28-31 May 2013
Firstpage :
835
Lastpage :
839
Abstract :
Compliant interconnects are able to mechanically decouple die from substrate and are helpful in reducing thermally-induced stresses in the die. In this paper, we report drop-test modeling of die-substrate assemblies with compliant interconnects. Simulations using explicit ANSYS/LS-DYNA® solver were carried out to mimic typical experimental conditions and to gain a better understanding of the overall response of the compliant interconnects under shock and impact loading. The finite-element models simulated dropping of die-substrate assemblies with compliant interconnects from different heights. The results from these simulations were compared against drop simulations of die-substrate assemblies with bump interconnects. The simulation results show that the compliant interconnects can significantly reduce the strains in the die under drop testing, while the bump interconnect does not have such an advantage.
Keywords :
assembling; finite element analysis; integrated circuit interconnections; ANSYS/LS-DYNA solver; bump interconnect; compliant interconnect; die-substrate assembly; drop impact isolation; drop-test modeling; finite-element model; impact loading; shock loading; strain reduction; thermally-induced stress reduction; Analytical models; Computational modeling; Finite element analysis; Load modeling; Loading; Strain; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic Components and Technology Conference (ECTC), 2013 IEEE 63rd
Conference_Location :
Las Vegas, NV
ISSN :
0569-5503
Print_ISBN :
978-1-4799-0233-0
Type :
conf
DOI :
10.1109/ECTC.2013.6575670
Filename :
6575670
Link To Document :
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