Title :
Development and characterization of a through-multilayer TSV integrated SRAM module
Author :
Yunhui Zhu ; Shenglin Ma ; Xin Sun ; Runiu Fang ; Xiao Zhong ; Yuan Bian ; Meng Chen ; Jing Chen ; Min Miao ; Wengao Lu ; Yufeng Jin
Author_Institution :
Nat. Key Lab. of Sci. & Technol. on Micro/Nano Fabrication, Peking Univ., Beijing, China
Abstract :
In this study, a stacked SRAM module with a built-in decoder was proposed with a through-multilayer TSV integration process. The through-multilayer TSVs provided data passages for all common signals, including the address bus, data bus, power, read and write control, which were redistributed at each individual chip, while the chip select signals were connected separately to the built-in decoder. Regarding this process, a novel double-layer spin coating technology was employed to prevent photoresist residue left inside TSVs, and the RDLs in this process could be fabricated using lift-off process prior to via filling. As a result, the front side CMP process was not necessary. A 10-layer through-multilayer TSV integration sample was successfully fabricated with this process. Preliminary testing results suggested that this process was promising for integration of memory chips with similar layout.
Keywords :
SRAM chips; chemical mechanical polishing; photoresists; three-dimensional integrated circuits; 10-layer through-multilayer TSV integration sample; RDL; address bus; built-in decoder; data bus; double-layer spin coating technology; front side CMP process; lift-off process; memory chips; photoresist residue; power control; read control; through-multilayer TSV integrated SRAM module; write control; Copper; Fabrication; Filling; Ring oscillators; SRAM chips; Through-silicon vias;
Conference_Titel :
Electronic Components and Technology Conference (ECTC), 2013 IEEE 63rd
Conference_Location :
Las Vegas, NV
Print_ISBN :
978-1-4799-0233-0
DOI :
10.1109/ECTC.2013.6575678