• DocumentCode
    628560
  • Title

    Characterization, modeling and optimization of 3D embedded trench decoupling capacitors in Si-RF interposer

  • Author

    Jacquinot, Helene ; Denis, David

  • Author_Institution
    LETI, CEA, Grenoble, France
  • fYear
    2013
  • fDate
    28-31 May 2013
  • Firstpage
    1372
  • Lastpage
    1378
  • Abstract
    Integrated trench high density MIS (Metal Insulator Semiconductor) capacitors in Si-interposer are of great interest as they provide decoupling in a smart way using the third dimension of the silicon substrate. However, the use of various highly integrated passive components on the same Si-interposer is challenging regarding wide frequency band performances and signal integrity. Both aspects are addressed in this paper based on 300 kHz-20 GHz vector network analyzer measurements on 3D 80 nF/mm2 decoupling capacitors produced by IPDIA on a high resistivity substrate. Firstly, a scalable 1 MHz-10 GHz wideband model of a 3D capacitor in the 100 pF-10 nF range is developed. Secondly, 3D electromagnetic simulations of substrate and capacitive coupling between 3D capacitors using guard ring are presented. All simulations show good agreement with measurements. To the best of our knowledge, this is the first time that a wideband mathematical model as well as an RF crosstalk study have been published on embedded trench decoupling capacitors.
  • Keywords
    MIS capacitors; circuit optimisation; elemental semiconductors; silicon; 3D electromagnetic simulation; 3D embedded trench decoupling capacitor; IPDIA; RF crosstalk; Si; Si-RF interposer; capacitance 100 pF to 10 nF; capacitive coupling; frequency 300 kHz to 20 GHz; guard ring; integrated trench high density MIS capacitor; metal insulator semiconductor capacitor; passive component; signal integrity; silicon substrate; vector network analyzer; wideband mathematical model; Capacitors; Couplings; Data models; Electrodes; Integrated circuit modeling; Mathematical model; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Components and Technology Conference (ECTC), 2013 IEEE 63rd
  • Conference_Location
    Las Vegas, NV
  • ISSN
    0569-5503
  • Print_ISBN
    978-1-4799-0233-0
  • Type

    conf

  • DOI
    10.1109/ECTC.2013.6575752
  • Filename
    6575752