• DocumentCode
    628617
  • Title

    Thermomechanical reliability of Ag flake paste for die-attached power devices in thermal cycling

  • Author

    Sakamoto, Shinji ; Nagao, Shijo ; Suganuma, Katsuaki

  • Author_Institution
    Inst. of Sci. & Ind. Res., Osaka Univ., Ibaraki, Japan
  • fYear
    2013
  • fDate
    28-31 May 2013
  • Firstpage
    1740
  • Lastpage
    1745
  • Abstract
    The developments of SiC power devices have been dramatically advanced for the last several years, and are gaining much attention as a key technology for the low carbon society. These SiC power devices are expected to work under the high temperature condition of 250-300°C because of the wide band-gap energy and the high heat resistance. To meet the high temperature operations, the die-bonding materials must have sufficient reliability under the extreme thermal environments. The present study hence focuses on the thermal reliability of the die-attach technology with using Ag flake paste, which can be sintered at about 200°C. For Si die-attachment on the Cu substrate, the Ag paste displays excellent reliability in the thermal cycles from -40°C to 180°C, and no serious degradation such as crack growth or interfacial debonding happens at either Si/Ag or Ag/Cu interfaces. The tested SiC die-attach samples maintained the high die-bonding strength up to 750 thermal cycles of -40°C and 250°C. However, thermal cracks and many voids appeared after 1000 cycles, and thus these damages due to thermal fatigue decreased the joining strength. These results indicate that the sintered Ag flake paste can withstand at the high operating temperature of new power devices, and our Ag paste can be employed as die-attach materials for both Si and SiC semiconductor power devices.
  • Keywords
    copper; power semiconductor devices; semiconductor device packaging; semiconductor device reliability; silicon; silicon compounds; silver; sintering; thermal management (packaging); thermal stress cracking; Ag; Cu; Si; SiC; die attach material; die attach technology; die attached power device; die attachment; die bonding material; semiconductor power device; silver flake paste; sintered flake paste; temperature -40 C to 250 C; thermal crack; thermal cycling; thermal reliability; thermomechanical reliability; wide band gap energy; Bonding; Microstructure; Reliability; Silicon; Silicon carbide; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Components and Technology Conference (ECTC), 2013 IEEE 63rd
  • Conference_Location
    Las Vegas, NV
  • ISSN
    0569-5503
  • Print_ISBN
    978-1-4799-0233-0
  • Type

    conf

  • DOI
    10.1109/ECTC.2013.6575810
  • Filename
    6575810