DocumentCode
630929
Title
Applications of control systems and optimization in the design of semiconductor capital equipment
Author
Ummethala, Upendra ; Hench, John J. ; van Lievenoogen, Anne ; Subrahmanyan, Pradeep
Author_Institution
KLA-Tencor Corp., Milpitas, CA, USA
fYear
2013
fDate
17-19 June 2013
Firstpage
5282
Lastpage
5285
Abstract
This tutorial presents several examples of high performance control systems in the Semiconductor equipment industry. Examples include technologies used in lithography and mask inspection.
Keywords
control systems; design engineering; inspection; lithography; manufacturing processes; masks; optimisation; production equipment; semiconductor industry; control systems; lithography technology; mask inspection technology; optimization; semiconductor capital equipment design; semiconductor equipment industry; Actuators; Adaptive optics; Electron beams; Lithography; Mirrors; Optical interferometry; Optical sensors;
fLanguage
English
Publisher
ieee
Conference_Titel
American Control Conference (ACC), 2013
Conference_Location
Washington, DC
ISSN
0743-1619
Print_ISBN
978-1-4799-0177-7
Type
conf
DOI
10.1109/ACC.2013.6580661
Filename
6580661
Link To Document