Title :
Advancement in Charge-Trap Flash memory technology
Author :
Tehrani, S. ; Pak, Jiwoo ; Randolph, Mark ; Yu Sun ; Haddad, Sandro ; Maayan, Eduardo ; Betser, Yoram
Author_Institution :
Spansion, Inc., Sunnyvale, CA, USA
Abstract :
Charge-trap Flash memory has been successfully productized in high volume for several technology generations. Two-bits-per-cell MirrorBit® charge-trap technology has been the industry benchmark for NOR Flash for more than a decade, spanning six generations of scaling. More recently Heterogeneous Charge Trap (HCT)™ NAND Flash as well as embedded Charge Trap (eCT)™ NOR Flash have been developed. The planar cell structures will enable continued scaling of these charge-trap technologies, while new architectures such as 3D charge-trap Flash will emerge and further extend the density-growth trend.
Keywords :
NOR circuits; flash memories; 3D charge-trap flash; HCT; NOR flash; eCT; embedded charge trap; flash memory technology; heterogeneous charge trap; industry benchmark; planar cell structures; two-bits-per-cell MirrorBit technology; Computer architecture; Flash memories; Industries; Interference; Logic gates; Microprocessors; Nonvolatile memory;
Conference_Titel :
Memory Workshop (IMW), 2013 5th IEEE International
Conference_Location :
Monterey, CA
Print_ISBN :
978-1-4673-6168-2
DOI :
10.1109/IMW.2013.6582082