DocumentCode :
633200
Title :
Low-polarization-dependent silica waveguide monolithically integrated on SOI photonic platform
Author :
Nishi, Hidetaka ; Tsuchizawa, Tai ; Kou, Rai ; Fukuda, Hiroshi ; Yamada, Koji
Author_Institution :
Nanophotonics Center, NTT Corp., Atsugi, Japan
fYear :
2013
fDate :
June 30 2013-July 4 2013
Firstpage :
1
Lastpage :
2
Abstract :
We developed a low-polarization-dependent silica waveguide, which was based on multi-layer core and fabricated at low temperature. We experimentally confirmed its low polarization dependence, and monolithically integrated it with silicon photonic dynamic devices.
Keywords :
integrated optics; optical fabrication; optical multilayers; optical waveguides; silicon compounds; silicon-on-insulator; SOI photonic platform; SiO2; low polarization dependence; monolithic integration; multilayer core; optical fabrication; silica waveguide; Arrayed waveguide gratings; Attenuation; Fabrication; Photonics; Silicon; Silicon compounds;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
OptoElectronics and Communications Conference held jointly with 2013 International Conference on Photonics in Switching (OECC/PS), 2013 18th
Conference_Location :
Kyoto
Type :
conf
Filename :
6597334
Link To Document :
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