• DocumentCode
    633846
  • Title

    Optical probing (EOFM / TRI): A large set of complementary applications for ultimate VLSI

  • Author

    Perdu, P. ; Bascoul, G. ; Chef, S. ; Celi, G. ; Sanchez, K.

  • Author_Institution
    DCT/AQ/LE, CNES, Toulouse, France
  • fYear
    2013
  • fDate
    15-19 July 2013
  • Firstpage
    119
  • Lastpage
    126
  • Abstract
    Electro Optical Techniques (EOFM: Electro Optical Frequency Mapping and EOP: Electro Optical Probing) and Dynamic Light Emission Techniques (TRE: Time Resolved Emission and TRI: Time Resolved Imaging) are dynamic optical probing techniques widely used at IC level for design debug and defect localization purpose. They can pinpoint the origin of timing issue or logic fault in up to date CMOS devices. Each technique has its advantages and its drawbacks allowing a common set of applications and more specific ones. We have been involved in the development of the most advanced techniques related to EOFM and TRI on various devices (down to 28nm technology). What we can expect with each technique, which one to choose, what are the limitations are questions that must be answered regarding tooling cost and skills involved. Based on the understanding of the bases of each technique, their complementarities and their limitations have been identified. Even if these techniques can solve most of the issues we encountered, we can wonder if they can be applied on future technologies and this aspect will also be discussed.
  • Keywords
    CMOS integrated circuits; VLSI; electro-optical devices; CMOS devices; EOFM/TRI; IC level; dynamic light emission techniques; dynamic optical probing techniques; electro optical frequency mapping; electro optical probing; time resolved emission; ultimate VLSI; Failure analysis; Frequency measurement; Laser applications; Laser beams; Laser transitions; Measurement by laser beam; Optical variables measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Physical and Failure Analysis of Integrated Circuits (IPFA), 2013 20th IEEE International Symposium on the
  • Conference_Location
    Suzhou
  • ISSN
    1946-1542
  • Print_ISBN
    978-1-4799-1241-4
  • Type

    conf

  • DOI
    10.1109/IPFA.2013.6599138
  • Filename
    6599138