Title :
Strain measurement of Fin structure using TEM objective lens dark-field off-axis holography
Author :
Zhu, Junan ; Tan, Hong ; Bello, A. ; Pham, Duc-Son ; Zhou, Y.K. ; Liu, Bernard Haochih ; Mai, Z.H. ; Du, Anna ; Zhao, Si Ping
Author_Institution :
Globalfoundries, Singapore, Singapore
Abstract :
In this work, TEM dark-filed off-axis holography using objective lens was investigated to study strain distribution in Fin structure induced by stress liner. Compared with Lorentz lens mode holography, objective lens holography provides much more improved spatial resolution and contrast which are critical for reliable strain measurement of small structures such as FinFETs. Result was also compared with nano-beam diffraction strain measurement technique.
Keywords :
MOSFET; diffraction; holographic optical elements; lenses; nanoelectronics; semiconductor device reliability; semiconductor device testing; strain measurement; transmission electron microscopy; FinFET; Lorentz lens mode holography; TEM dark-filed off-axis holography; TEM objective lens dark-field off-axis holography; contrast; fin structure; nanobeam diffraction strain measurement technique; reliable strain measurement; spatial resolution; strain distribution; stress liner; Diffraction; Holography; Lenses; Silicon; Spatial resolution; Strain; Strain measurement;
Conference_Titel :
Physical and Failure Analysis of Integrated Circuits (IPFA), 2013 20th IEEE International Symposium on the
Conference_Location :
Suzhou
Print_ISBN :
978-1-4799-1241-4
DOI :
10.1109/IPFA.2013.6599161
