Advanced methodologies for atomic-scale nanofabrication and dynamic characterization

Author

Xing Wu ; Litao Sun

Author_Institution

SEU-FEI Nano-Pico Center, Southeast Univ., Nanjing, China

fYear

2013

fDate

15-19 July 2013

Firstpage

393

Lastpage

399

Abstract

Based on the idea of “setting up a nanolab inside a transmission electron microscopy (TEM)”, we review our recent progress in atomic resolution nanofabrication and dynamic characterization of individual nanostructures and nanodevices. The electron beam can be used as a tool to induce nanofabrication on the atomic scale. Additional probes from a special-designed holder provide the possibility to further manipulate and measure the electrical properties of the nanostructures. All phenomena from the in-situ TEM experiments can be recorded in real time with atomic resolution.

Keywords

nanoelectronics; nanofabrication; nanowires; sample holders; transmission electron microscopy; atomic resolution nanofabrication; atomic scale nanofabrication; dynamic characterization; electron beam; individual nanostructure; nanolab set-up; nanostructure electrical properties; special designed holder; transmission electron microscopy; Crystals; Electrodes; Electron beams; Fabrication; Radiation effects; Transmission electron microscopy; Dynamic characterization; Nanodevice; Nanofabrication; Transmission electron microscopy;

fLanguage

English

Publisher

ieee

Conference_Titel

Physical and Failure Analysis of Integrated Circuits (IPFA), 2013 20th IEEE International Symposium on the

Conference_Location

Suzhou

ISSN

1946-1542

Print_ISBN

978-1-4799-1241-4

Type

conf

DOI

10.1109/IPFA.2013.6599188

Filename

6599188