DocumentCode :
633874
Title :
Advanced methodologies for atomic-scale nanofabrication and dynamic characterization
Author :
Xing Wu ; Litao Sun
Author_Institution :
SEU-FEI Nano-Pico Center, Southeast Univ., Nanjing, China
fYear :
2013
fDate :
15-19 July 2013
Firstpage :
393
Lastpage :
399
Abstract :
Based on the idea of “setting up a nanolab inside a transmission electron microscopy (TEM)”, we review our recent progress in atomic resolution nanofabrication and dynamic characterization of individual nanostructures and nanodevices. The electron beam can be used as a tool to induce nanofabrication on the atomic scale. Additional probes from a special-designed holder provide the possibility to further manipulate and measure the electrical properties of the nanostructures. All phenomena from the in-situ TEM experiments can be recorded in real time with atomic resolution.
Keywords :
nanoelectronics; nanofabrication; nanowires; sample holders; transmission electron microscopy; atomic resolution nanofabrication; atomic scale nanofabrication; dynamic characterization; electron beam; individual nanostructure; nanolab set-up; nanostructure electrical properties; special designed holder; transmission electron microscopy; Crystals; Electrodes; Electron beams; Fabrication; Radiation effects; Transmission electron microscopy; Dynamic characterization; Nanodevice; Nanofabrication; Transmission electron microscopy;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Physical and Failure Analysis of Integrated Circuits (IPFA), 2013 20th IEEE International Symposium on the
Conference_Location :
Suzhou
ISSN :
1946-1542
Print_ISBN :
978-1-4799-1241-4
Type :
conf
DOI :
10.1109/IPFA.2013.6599188
Filename :
6599188
Link To Document :
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