DocumentCode :
635689
Title :
Study of the uniformity of 300mm wafer through ring- resonator analysis
Author :
Chauveau, C. ; Labeye, P. ; Fedeli, J.-M. ; Blaize, S. ; Lerondel, G.
Author_Institution :
CEA-Leti Minatec Campus, Grenoble, France
fYear :
2012
fDate :
11-14 Sept. 2012
Firstpage :
1
Lastpage :
3
Abstract :
The uniformity of a 300mm wafer has been analyzed through the study of resonant wavelength of ring resonators. SOI thickness variation can be compensated with the use of Ti-TiN heater.
Keywords :
integrated optics; optical resonators; silicon-on-insulator; titanium compounds; SOI thickness variation; Si; Ti-TiN; heater; resonant wavelength; ring-resonator analysis; size 300 mm; Heating; Optical device fabrication; Optical filters; Optical refraction; Optical ring resonators; Optical variables control; Optical waveguides;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photonics in Switching (PS), 2012 International Conference on
Conference_Location :
Ajaccio
Electronic_ISBN :
978-2-9123-2861-8
Type :
conf
Filename :
6608241
Link To Document :
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