Title :
Impact of Interface Charge on the Electrostatics of Field-Plate Assisted RESURF Devices
Author :
Boksteen, Boni K. ; Ferrara, A. ; Heringa, Anco ; Steeneken, Peter G. ; Hueting, Raymond J. E.
Author_Institution :
MESA+ Inst. for Nanotechnol., Univ. of Twente, Enschede, Netherlands
Abstract :
A systematic study on the effects of arbitrary parasitic charge profiles, such as trapped or fixed charge, on the 2-D potential distribution in the drain extension of reverse-biased field-plate-assisted reduced surface field (RESURF) devices is presented. Using TCAD device simulations and analytical means, the significance of the so-called characteristic or natural length λ is highlighted with respect to the potential distribution and related phenomena in both ideal (virgin) and nonideal (degraded) extensions. Subsequently, a novel and easy-to-use charge-response method is introduced that enables calculation of the potential distribution for an arbitrary parasitic charge profile once the peak potential and lateral fall-off (∝λ) caused by a single unit charge has been determined. This can be used for optimizing and predicting the performance, also after hot carrier injection, of RESURF power devices.
Keywords :
electrostatics; field effect devices; 2D potential distribution; RESURF power device; charge response method; drain extension; electrostatics; field plate assisted RESURF device; interface charge; parasitic charge profile; reverse biased field plate assisted reduced surface field devices; Approximation methods; Electric potential; Electrostatics; Equations; Mathematical model; Semiconductor device modeling; Silicon; Electrostatics; FinFET; SOI; SOI.; high-voltage; hot-carrier-induced charge injection (HCI); interface charge; junctionless transistor; reduced surface field (RESURF);
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/TED.2014.2327574