Title :
Forming SiO2 thin film by CO2 laser annealing of spin-on glass on polycrystalline silicon thin film
Author :
Hishitani, Daisuke ; Horita, Masahiro ; Ishikawa, Yozo ; Ikenoue, Hiroshi ; Watanabe, Yoshihiro ; Uraoka, Y.
Author_Institution :
Grad. Sch. of Mater. Sci., Nara Inst. of Sci. & Technol., Ikoma, Japan
Abstract :
Per-hydro-polysilazane as SiO2 precursor was spin-coated on the polycrystalline silicon substrate and CO2 laser was irradiated to per-hydro-polysilazane for transformation into SiO2. Atomic force microscope analysis showed that the appropriate condition of CO2 laser is possible to form flat SiO2 film on poly-Si surface which has ridges. Fourier transform infrared spectroscopy, x-ray photoelectron spectroscopy and secondary ion mass spectrometry analysis revealed that high quality and uniform SiO2 film in the depth direction was obtained by CO2 laser annealing compared with conventional furnace annealing.
Keywords :
Fourier transform spectra; X-ray photoelectron spectra; atomic force microscopy; infrared spectra; laser beam annealing; secondary ion mass spectra; silicon compounds; spin coating; thin films; Fourier transform infrared spectroscopy; Si; SiO2; X-ray photoelectron spectroscopy; atomic force microscopy; laser annealing; per-hydro-polysilazane; poly-Si surface; polycrystalline silicon substrate; polycrystalline silicon thin film; secondary ion mass spectrometry; spin-coating; spin-on glass; Annealing; Films; Rough surfaces; Silicon; Substrates; Surface morphology; Surface roughness;
Conference_Titel :
Active-Matrix Flatpanel Displays and Devices (AM-FPD), 2013 Twentieth International Workshop on
Conference_Location :
Kyoto
